Flow-lithography is a lithographic method for continuously generating polymer microstructures for various applications such as bioassays, drug-delivery, cell carriers, tissue engineering and ...
The X-ray lithography process is almost identical to photolithography and extreme ultraviolet lithography but uses a mask is made from an X-ray transparent material with a pattern of high Z material ...
The growing demand for heterogeneous integration is driven by the 5G market. This includes smartphones, data centers, servers, high-performance computing (HPC), artificial intelligence (AI) and ...
These applications put forward stringent fabrication requirements, including dimensional accuracy, shape accuracy, and surface roughness. Two-photon lithography is a versatile technique capable of ...
(Nanowerk News) Flow-lithography is a lithographic method for continuously generating polymer microstructures for various applications such as bioassays, drug-delivery, cell carriers, tissue ...
The ability to create intricate, nano-scale patterns is at the heart of nanotechnology, and lithography techniques are the tools that make this possible. From photolithography to FIB, each technique ...
The existing lithography mask standard of 4x magnification with a 26mm field size is likely resilient enough to take the semiconductor industry to the 32 nm half-pitch generation, Sematech said ...
SAN FRANCISCO — Lithography photomasks are likely to continue to rely on the current standard 4X magnification and 26-millimeter field size through the 32-nanometer node, according to a consensus of ...
MELVILLE, N.Y., July 7, 2020 /PRNewswire/ -- Canon U.S.A., Inc. today announced that its parent company, Canon Inc., expects to commence sales in early July 2020 of the FPA-8000iW i-line stepper1, a ...