SCREEN and IBM Sign Agreement for Next-Generation EUV Lithography Cleaning Process Development - Agreement builds on more than a decade of collaboration between the two …

Single Wafer Cleaner SU-3400 The Evolution of the World's No. 1* Cleaning Equipment * Based on SCREEN in-house research

To address this issue, as a leader in semiconductor production equipment, the SCREEN Group has developed an innovative technology for reducing organic wastewater with the potential to …

This page provides materials for SCREEN Holdings’ shareholders and investors. It contains a range of information, including details of shareholders meetings, management policies, share …

PlateRite 8600NII-Z/S/E De facto standard 8 page thermal CtP delivering the best balance of productivity and exposure quality These systems feature the latest fiber laser diode exposure …

*APAC: Advanced Process Atmosphere Control. Screen’s ultra-clean chamber technology.

The SS-80EX features the same advanced spin scrubber technology developed by SCREEN over many years while also delivering significantly improved functionality. High-speed processing of …

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Building up the technology of the most stable and successful printers of its kind, the Truepress LABEL 350UV and 350UV+ series, the new Truepress LABEL 350UV SAI range additionally …

1. High Throughput The FC-3100 is capable of achieving a high throughput of 1,000 wafers per hour, which has been realized by incorporating a high throughput buffer module and a high …